ito sputtering target material

Brand Name:APG

Place of Origin:china

ITO target material is a composite material made by mixing indium oxide (In₂O₃) and tin oxide (SnO₂) in a specific ratio. This special combination gives ITO target material unique physical and chemical properties, achieving high transparency and low resistance in the thin film through precise component ratio. ITO...

Brand Name:Feiteng

Model Number:Titanium tube target

Place of Origin:Baoji, Shaanxi, China

Titanium Tube Target Titanium Gr2 ASTM B861-06 a 133OD*125ID*2140L Vacuum Coating Target Item name Titanium tube target Size φ133*φ125*2140 Grade Gr2 Packaging Wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port...

Brand Name:High Broad

Model Number:Hf sputtering targets

Place of Origin:China

Hafnium Pellet 99.9% Pure Hf pellet 3N for sale Products attributes of Hf pellets Item Name PVD Coating materials Hf pellet Purity 99.99% Shape Square/Round, According to your request according to your request Available size Normal size:2*5mm,3*3mm,6*6mm ...

Brand Name:JINXING

Model Number:Zirconium Sputtering Target

Place of Origin:China

...Sputtering Target Zirconium Rotatable Sputtering Target , Zirconium Rotatable Target , Zirconium Sputtering Target , Zirconium Rotary Sputtering Target , Zirconium Rotating Sputtering Target. Description JINXING company focus on the sputtering target ( Rotatable sputtering target , Planar Sputtering target , Spray Rotary sputtering target , Noble Metal sputtering target and Evaporation material . Material...

Brand Name:CSTI

Model Number:20221110

Place of Origin:China

The chromium sputtering target material is produced by the advanced hot isostatic pressing (HIP) process. sputtering target include rectangular target, arc target, ring target and large aspect ratio integrally formed tube target, etc., with controllable ...

Brand Name:Sanhui

Model Number:Mo1

Place of Origin:Henan, China

... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass,

Brand Name:LHTI

Model Number:LH-10

Place of Origin:China

...target" in "titanium sputtering target" comes from the common target materials in our daily life. In the sputtering deposition process, the coating material is bombarded by the electron beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal titanium to titanium sputtering target Titanium sputtering target...

Categories:Sputtering Target

Country/Region:china

...sputtering target is a high-purity functional material widely used in solar cells, semiconductor coatings, optical coatings, and magnetic materials. The product is made from high-purity praseodymium metal through precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering...

Brand Name:ZCQ

Model Number:ZCQ

Place of Origin:China

...e from two of the most abundant materials on the planet: silicon (Si) and oxygen (O2). Silica is most commonly considered to be in the form of quartz. It exists naturally in water, plants, animals and the ...

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and

Categories:Molybdenum Products

Country/Region:china

... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,

Brand Name:ZHENAN

Model Number:Pure Tungsten Metal Sputtering Target

Place of Origin:China

...fields because of its excellent physical and chemical properties. Sputtering targets are used for magnetron sputtering coating, which is a new type of physical vapor coating (PVD) method. An orthogonal magnetic field and an electric field are added between

Brand Name:Forged

Model Number:customized

Place of Origin:Luoyang Henan, China

...plane target, multi-arc target, step target, special-shaped target Applicable equipment: magnetron sputtering equipment, ion sputtering instrument, etc Freight shipping According to the consumer’s demands. size customized pay attention heavy quantity is

Brand Name:PRM

Model Number:custom

Place of Origin:China

... from molybdenum powder. In most cases, it is made from the anode itself, which is sintered molybdenum powder, and the target is formed by the anode. Anodes can be stationary or rotating anodes. Other standard methods, chemical vapor deposition, or again,

Brand Name:TORICH

Model Number:304L

Place of Origin:China

Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ...

Brand Name:PRM

Model Number:custom

Place of Origin:China

Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder...

Brand Name:TOBO

Model Number:NI 200

Place of Origin:China

... rolled cold rolled Length as customer's request Surface Pickling annealed surface Material Ni 98% Grade inconel 600 625 incoloy800 N04400 N08020 N08367 Standards AISI ASTM UNS Certifications ISO ...

Brand Name:Baidun

Place of Origin:China

Model Number:VM-EG400

...sputtering targets. Minimal outgassing and zero contamination design.Key Features Vacuum compatible ultra-low outgassing 6N purity retention capability Semiconductor grade material quality Clean melting for target manufacturing Batch traceability documentationApplications