hwf6630 10 chemical vapor deposition furnace

Brand Name:Chitherm

Model Number:Hwf6630-10

Place of Origin:China

...Furnace Model HWF6630-10 Tank-Type Chemical Vapor Deposition Furnace Product Specifications Attribute Value Heating Zone Dimensions Φ660×300mm(D*H) Heating Rate ≤6ºC/Min Usage Ceramic Sintering Range of Applications Industrial Temperature Control Stability ±1ºC Atmosphere Nitrogen/Hydrogen/Acetylene Package Gross Weight 750.000kg Product Overview The HWF6630-10 tank vapor deposition furnace...

Brand Name:Chitherm

Model Number:Hwf6630-10

Place of Origin:China

... of related materials in nitrogen, acetylene, and hydrogen atmospheres, and can also be used for sintering processes of related materials under protective atmospheres. The furnace is fully equipped with a real-time computer monitoring system, making it

Place of Origin:Shaanxi, China

Brand Name:AE

...vapor deposition furnace Vacuum vapor deposition furnace Vertical Chemical Vapor Deposition Furnace, CVD Furnace, Cvi Furnace, Furnace, Vacuum Furnace Main features: Use of vapor deposition furnace: This chemical vapor deposition graphitization integrated furnace can be used for chemical vapor deposition...

Brand Name:Jingtan

Place of Origin:China

...the surface of the target material. It is also used for chemical vapor deposition of composite materials with hydrocarbon gas (such as C3H8, etc.) as carbon source, such as C/C composite materials, SiC composite materials, CVD, CVI processing. ...

Brand Name:Brother Furnace

Model Number:BR-PECVD

Place of Origin:China

Lab Plasma Enhanced Chemical Vapor Deposition Furnace up to 1200 Degree Intelligent PECVD Introduction: PECVD system is designed to decrease the reaction temperature of traditional CVD. It installed RF induction ...

Brand Name:Ruideer

Model Number:430/530/630

Place of Origin:China

Chemical Vapor Deposition Furnace for cutting tools The equipment is designed for carbide cutting tools, which can be coated with TiC, TiN, TiCN and Al2O3, hardened thin-film material. CVD coating and the matrix of high binding strength, strong adhesion, ...

Brand Name:XDEM

Model Number:XDEM-1200T-PECVD

Place of Origin:China

Plasma Enhanced Chemical Vapor Deposition PECVD System Machine PECVD system, by ionizing atom-containing gas with microwave or radio frequency, create active plasma locally, which will react easily to deposit and form the expected thin film. It is suitable...

Brand Name:HJ

Model Number:LPCVD,MOCVD,PECVD

Place of Origin:China

Chemical Vapor Deposition (CVD) System Ultimate Vacuum 5*10-3Pa Vacuum Coating Machine Scope of Application with Vacuum Coating Machine: Film deposition in semiconductor chip industry, solar photovoltaic, LED and other industries. Product Features with ...

Brand Name:CAEC

Place of Origin:Henan, China

CVD large size single crystalline diamond CVD Single Crystalline Diamond 70GPa -120GPa Chemical Vapor Deposition Diamond Dimension: ≤ 20*20*3mm Nitrogen content: 0.1-10ppm Hardness: 70-120 GPa Young's modulus:1050 GPa Thermal conductivity: 1800-2300W/mK @ ...

Brand Name:ZMSH

Model Number:LPCVD Oxidation Furnace

Place of Origin:CHINA

...Furnace 6inch 8inch 12inch LPCVD Oxidation Furnace for Uniform Thin-Film Deposition LPCVD (Low Pressure Chemical Vapor Deposition) systems serve as critical thin-film deposition equipment in semiconductor manufacturing, primarily employed for growing polysilicon, silicon nitride, and silicon oxide films. The technology's key advantages include: 1) Low-pressure environment (0.1-10...

Brand Name:ZMSH

Model Number:SiC Boule growth furnace

Place of Origin:China

...Furnace PVT, HTCVD, and LPE Technologies for Single Crystal SiC Boule Production SiC Boule Growth Furnace's Abstract ZMSH proudly offers the SiC Boule Growth Furnace, an advanced solution engineered for the production of single crystal SiC Boules. Utilizing cutting-edge technologies such as PVT (Physical Vapor Transport), HTCVD (High Temperature Chemical Vapor Deposition...

Brand Name:PRM

Place of Origin:China

Model Number:custom

Product Description: Molybdenum silicide (MoSi2) is a ceramic material with a high melting point (about 2620 degrees Celsius) and good electrical conductivity. Molybdenum silicide heating elements are usually made of molybdenum silicide material, which...

Brand Name:YUDA CRYSTAL

Model Number:YD-A+

Place of Origin:Zhengzhou, China

...10.0 - 11.0 Carat HPHT Rough Diamonds For 3carat Big Size Diamond HPHT Jewelry HPHT Lab Grown Diamonds Description Lab created diamonds are grown by simulating the growth environment of natural diamonds through high temperature and high pressure or chemical vapor deposition method. The chemical...

Place of Origin:China

Brand Name:SONGYU

H-type silicon carbide rod Silicon carbon rods have good chemical stability and strong acid resistance. Alkaline substances have an erosive effect on it under high temperature conditions. Silicon carbon rod components can undergo the following reactions...

Brand Name:AOJIA

Model Number:SPIRON 17-88L/R II

Place of Origin:CHINA

... vapor deposition (CVD). The deposition temperature of the former is 500°C, and the coating thickness is 2~5μm; the deposition temperature of the latter is 900°C~1100°C, the coating thickness can reach 5~10μm, and the equipment is simple and the

Brand Name:Infi

Place of Origin:China

...μm) for ultra-precision chamfering PCD (Polycrystalline Diamond): Superior impact resistance, ideal for roughing composites and cemented carbides CVD (Chemical Vapor Deposition Diamond): Exceptional thermal stability (>1200°C)

Brand Name:Infi

Model Number:Null

Place of Origin:Hunan, China

...-8mm 2.Clarity: S1,S2,VS,VVS 3.Color: E,F,G,H 4.Type: CVD/HPHT laboratory grown diamond 5.Hardness: Mohs 10 6.Process: Chemical Vapor Deposition High Pressure High Temperature Size available: 1.2-1.5mm

Brand Name:WEIMENG

Model Number:WM-C-051

Place of Origin:Shaanxi,China(Mainland)

... CO2 Laser Focus Lens / Laser Protection Lens Material Znse Laser Grade CVD Type Working wavelength 10.6μm Clear Aperture >90%