Metallic Pure Polished Molybdenum Sputtering Targets
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...Target Description Pure Molybdenum Round Target, also known as molybdenum sputtering target, can be divided into two types, that is, molybdenum planar target and molybdenum rotary target. Features of Molybdenum Round Target 1. Thin-film deposited from molybdenum sputtering target is high in density and adhesion......
JINXING MATECH CO LTD
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Ni Nickel Sputtering Target Corrosion Resistance Flat Target Rotating Target
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...targets are sputtering targets made from high-purity nickel metal, offering excellent ductility, corrosion resistance, and magnetic properties. They exhibit good adhesion and film density during the film deposition process, and are widely integrated across the semiconductor, electronics, electroplating, optical coating, and renewable energy sectors.Nickel targets are commonly used for sputter......
Shenzhen APG Material Company Limited
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10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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Titanium Ti Ti-Al Zr Cr Sputtering Target Disc For PVD Coatiing
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... high-purity metals or ceramics using advanced technologies such as melting, sintering, synthesis, and precision machining. We provide sputtering target products in a wide range of materials, purities, and shapes. Each target is fabricated according to the...
Baoji City Changsheng Titanium Co.,Ltd
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Natural Compound Fused Silica Sputtering Target High Temperature Resistant
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High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ......
Yantai ZK Optics Co., Ltd.
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99.6% Purity GR1 GR2 Round Titanium Sputtering Target Hardware
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...target" in "titanium sputtering target" comes from the common target materials in our daily life. In the sputtering deposition process, the coating material is bombarded by the electron beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal titanium to titanium sputtering target Titanium sputtering target......
Baoji Lihua Nonferrous Metals Co., Ltd.
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High-Dielectric Lanthanum Sputtering Target for Leakage-Free Semiconductor Memory Chip Fabrication
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...ough precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering. Application Areas 1.Semiconductor Memory Chips: Used for...
Shanghai Sheeny Metal Mateirals Co.,Ltd.
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Feiteng Magnetron Cr Sputtering Target OD127*ID458*10
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...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target......
Baoji Feiteng Metal Materials Co., Ltd.
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Molybdenum Parts High Purity 99.95% Pure Tungsten Molybdenum Sputtering Target
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... substrates. Molybdenum sputtering targets exhibit excellent thermal and electrical conductivity properties. They are known for their high melting point, good adhesion, and uniform film deposition. Molybdenum targets are widely used in industries such...
Luoyang Hypersolid Metal Tech Co., Ltd
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Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems
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... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and...
HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD
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