Pvd Chromium Sputtering Target/Cr Sputtering Target/Chrome Target Price
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Pvd Chromium Sputtering Target/Cr Sputtering Target/Chrome Target Price Cr Sputtering Target Information Purity: 99.5-99.95%; Circular: Diameter <= 14 inch, Thickness >= 1mm; Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm; Targets Type: Planar sputtering target, Rotary sputtering target......
JINXING MATECH CO LTD
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Ti Ti-Al Zr Cr Fe Cu PVD Coating Sputtering Targets 100*40mm 95*45mm 98*10mm
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...Sputtering targets are source materials used to deposit thin films through the sputtering process. These targets are manufactured by processing metals or ceramics through techniques such as melting, sintering, and precision machining. We provide sputtering targets made from a wide range of materials, purities, and shapes. By combining advanced technologies in material synthesis and mechanical processing, we can produce targets...
Baoji City Changsheng Titanium Co.,Ltd
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High Purity Pvd Titanium Sputtering Target Metal Target Customized
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.... It can be devided into pure non-ferrous metal target, pure titanium Ti, pure nickel Ni, chromium Cr, niobium Nb, aluminum Al, molybdenum Mo according to the material. In principle, all kinds of metals can be used as targets.The sputtering targets we can...
Baoji Lihua Nonferrous Metals Co., Ltd.
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Ceramic Sputtering Target Cadmium sulfide target material
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Ceramic Sputtering Target Product Introduction: Various ceramic target materials produced by vacuum hot pressing sintering method have advanced technology and mature production processes. The products are mainly used in thin belly solar cells Energy, flat ......
HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD
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Titanium Boride TiB2 Ceramic Sputtering Target For PVD Coating
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...targets are ceramic targets manufactured from high-purity TiB₂ powders through hot pressing or sintering processes. They are functional materials with high melting points and high hardness. By combining the excellent chemical stability of metallic titanium with the high hardness, wear resistance, and corrosion resistance of borides,TiB₂ targets offer exceptional performance. These targets......
Shenzhen APG Material Company Limited
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High Purity Molybdenum Tube Sputtering Targets Rotating Targets With 3000mm Length
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...molybdenum rotary target. Molybdenum target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass, ion coating and other ......
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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PVD Magnetron Sputtering Coating Machine For Jewelry Easy Operation
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... DC Magnetron Sputtering Power Supply Amount According To Target Amount Bias Power Supply Amount 1 Set PVD Coating Machine Advantage 1) Environmental Friendly 2) High Energy Efficiency 3) Easy Operation 4) Safe PVD Coating Machine PVD Coating Colors: Gold,...
Foshan Jinxinsheng Vacuum Equipment Co., Ltd.
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99.95% Pure Tungsten Sputtering Target Metal W Tungsten Target Anti Corrosion
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...fields because of its excellent physical and chemical properties. Sputtering targets are used for magnetron sputtering coating, which is a new type of physical vapor coating (PVD) method. An orthogonal magnetic field and an electric field are added between...
Zhenan Metallurgy Co., Ltd
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Molybdenum Parts High Purity 99.95% Pure Tungsten Molybdenum Sputtering Target
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... substrates. Molybdenum sputtering targets exhibit excellent thermal and electrical conductivity properties. They are known for their high melting point, good adhesion, and uniform film deposition. Molybdenum targets are widely used in industries such...
Luoyang Hypersolid Metal Tech Co., Ltd
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High Purity Tungsten Metal Alloy Tungsten Sputtering Target GB/T19001 Approved
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... target product for sales high temperature resistance Product Description High quality tungsten target product for sales Properties Target weight:≤200kg/pc, Purity:≥99.95%. Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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