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Customizable Ratio Alloy Sputtering Target

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customizable ratio alloy sputtering target

from 53 Products

PVD Titanium Alloy Sputtering Target

China PVD Titanium Alloy Sputtering Target on sale
...Alloy Sputtering Target Description PVD coating technology physically converts a material from a solid state to a gaseous state, which is then deposited on a target substrate to form a thin film. The properties of the target material directly affect the quality, performance and cost-effectiveness of the film. PVD Titanium Alloy Sputtering Target PVD Titanium alloy sputtering Target is made of high quality titanium alloy......
JINXING MATECH CO LTD

Address: NO.57 KEXUEDADAO ROAD

TiAl Titanium Aluminum Alloy Sputtering Target

China TiAl Titanium Aluminum Alloy Sputtering Target on sale
...Alloy Sputtering Target This titanium aluminum alloy (TiAl) sputtering target is a lightweight PVD material with high purity, fine and uniform particle size and good formability. It is produced in several Ti/Al composition ratios and supplied in round shape with a polished surface, hot isostatically pressed and checked by ultrasonic testing. TiAl targets......
Baoji Lihua Nonferrous Metals Co., Ltd.

Address: No. 3, Gaoya Industrial Park, Baotai Road, Gaoxin Development Zone, Baoji City, Shaanxi Province,China

Aluminum Neodymium Alloy Sputtering Target for High-Quality Display & Touch Screen Electrode Coating

China Aluminum Neodymium Alloy Sputtering Target for High-Quality Display & Touch Screen Electrode Coating on sale
...high-purity aluminum and neodymium through precision alloying processes, featuring uniform alloy composition and stable sputtering performance. The formed film effectively suppresses "hillock" growth in the electrode layer, improving electrode flatness and...
Shanghai Sheeny Metal Mateirals Co.,Ltd.

Address: Room 210, Kaidi Building, No. 688, Huajiang Road, Jiading District, Shanghai

Indium Alloy Sputtering Target With Customized Substrates Polished And Anodized

China Indium Alloy Sputtering Target With Customized Substrates Polished And Anodized on sale
Product Description: Our Metal Sputtering Target product boasts of a polished and anodized surface, providing you with a smooth and clean surface for your metal deposition process. The customized substrate compatibility feature of this product is what sets......
Baoji City Changsheng Titanium Co.,Ltd

Address: No.26 Baotai Road, Weibin District, Baoji City

NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy

China NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy on sale
NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request ......
TOBO STEEL GROUP CHINA

Address: No.208,Lvdi Road,Baihe Town,Qingpu District,Shanghai,China

Silicon-Aluminum Sputtering Target(SiAl Sputtering Target)

China Silicon-Aluminum Sputtering Target(SiAl Sputtering Target) on sale
... machining, it forms a high-density, uniform functional target material. With silicon's semiconductor properties and aluminum's excellent thermal conductivity, the silicon-aluminum target can deposit thin films with strong adhesion, uniform thickness, and...
Shenzhen APG Material Company Limited

Address: HQ Add:Rooms 1401,Bldg.2,Runzhi R&D Center,CRB Tech-Innovative City, Xinan Street,Bao'an District,Shenzhen,China

Non Magnetic Molybdenum Copper Alloy Magnetron Sputtering Target Molybdenum Alloy Target

China Non Magnetic Molybdenum Copper Alloy Magnetron Sputtering Target Molybdenum Alloy Target on sale
...Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder with coarse particle size is used to sinter into a molybdenum billet skeleton, and then infiltrated in copper liquid to obtain molybdenum-copper alloys......
Shaanxi Peakrise Metal Co.,Ltd

Address: No.188 Gaoxin Road,Weibin District Baoji City,Shaanxi,China

Non Magnetic Molybdenum Copper Alloy Magnetron Sputtering Target Molybdenum Alloy Target

China Non Magnetic Molybdenum Copper Alloy Magnetron Sputtering Target Molybdenum Alloy Target on sale
...Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder with coarse particle size is used to sinter into a molybdenum billet skeleton, and then infiltrated in copper liquid to obtain molybdenum-copper alloys......
Shaanxi Peakrise Metal Co.,Ltd

Address: No.188 Gaoxin Road,Weibin District Baoji City, Shaanxi ,China 7210013

Tantalum Tungsten Alloy Square Tungsten Sputtering Target Hot Isostatic Pressing

China Tantalum Tungsten Alloy Square Tungsten Sputtering Target Hot Isostatic Pressing on sale
...plane target, multi-arc target, step target, special-shaped target Applicable equipment: magnetron sputtering equipment, ion sputtering instrument, etc Freight shipping According to the consumer’s demands. size customized pay attention heavy quantity is...
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.

Address: No. 102, Building 33, Phase II of Zhongde Industrial Park, Yibin District, Luoyang City, Henan Province

99.99% Pure Titanium Disc 4n High Purity Ti Metal Sputtering Target Low Density

China 99.99%  Pure Titanium Disc 4n High Purity Ti Metal Sputtering Target  Low Density on sale
...Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The new titanium alloy has good heat resistance and can be used for a long time at 600℃ or higher temperature. Impurity Content Ratios......
Gnee Steel (tianjin) Co., Ltd.

Address: FLAT/RM 1512 15/F LUCKY CENTRE NO.165-171 WAN CHAI ROAD WAN CHAI HK

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