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High Purity Pvd Titanium Sputtering Target Metal Target Customized

Categories Titanium Target
Brand Name: LHTI
Model Number: LH-10
Certification: ISO9001
Place of Origin: China
MOQ: 10 pieces
Price: US dollar $ 25.5/pc--US dollar $125/pc
Payment Terms: L/C, D/P, T/T, Western Union,paypal etc
Supply Ability: 5000 piece per week
Delivery Time: 15-20 days
Packaging Details: Pearl cotton wrap or Sealed packaging,outside is standard Carton case or plywood case,or according your requirment to package
Product name: High purity pvd titanium sputtering target Metal target customized
Material: Pure Titanium, Titanium alloy
Application: Coating industry, sputtering vacuum coating industry
Keyword: Titanium Sputtering Target
Package: Plywood case or according your requirment
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High Purity Pvd Titanium Sputtering Target Metal Target Customized

High purity pvd titanium sputtering target Metal target customized


Sputtering target can be devided into rotating target, plane target, multi-arc target according to the working principle.


It can be devided into pure non-ferrous metal target, pure titanium Ti, pure nickel Ni, chromium Cr, niobium Nb, aluminum Al, molybdenum Mo according to the material. In principle, all kinds of metals can be used as targets.The sputtering targets we can provide: alloy targets, zirconium aluminum ZrAl, nickel chromium NiZr, titanium aluminum TiAl, titanium nickel TiNi, nickel chromium NiCr,copper titanium TiCu etc. The metal ratio of the alloy target is titanium-aluminum alloy as an example: 50:50wt% mass ratio, 80:20at% atomic ratio.


Product name: titanium sputtering target

Purity: 99.5%, 99.95%, 99.98%, 99.995%.

Size: diameter 300*40mm, diameter 300*25mm, diameter100*40mm, diameter 99*40mm, diameter 65*40mm etc. Or as customers' drawings.

Material:

1. Pure titanium: GR1 GR2

2. Titanium alloy: Gr5 titanium, titanium aluminum TiAl, titanium nickel TiNi, titanium chromium TiCr, titanium zirconium TiZr,copper titanium TiCu etc.

3. Others material: Zirconium sputtering targets, chrome sputtering targets,tungsten sputtering targets,copper sputtering targets etc.

Applications: Decorative coating,Hardware tool coating,Semiconductor,Flat panel displays

Features: Competitive pricing, High purity,Grain refined, Engineered microstructure

(average grain size < 20 um),Semiconductor grade


Detailed images:


Vacuum coating : a method of making a film on a substrate under vacuum) can meet this accuracy requirement.


Advantages of vacuum coating: 1. This process does not produce industrial waste water, waste gas, or waste residue, and has great environmental advantages; 2. This process is a physical reaction (PVD physical vapor deposition), which will not damage the product Material and original performance; 3. Since the thickness of the produced film is micron nanometer level, and the film thickness is uniform, it will not damage the appearance and size of the product, and the accuracy is extremely high.


About our company:



China High Purity Pvd Titanium Sputtering Target Metal Target Customized factory
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